ion sheath
英 [ˈaɪən ʃiːθ]
美 [ˈaɪən ʃiːθ]
n. 离子鞘；离子覆盖，离子层
双语例句
- It was shown that the ion density is higher and the electron temperature is lower in the vicinity of inductively coupled plasma sheath according to the ionic line and atomic line.
原子谱线和离子谱线特性分析表明，在鞘层附近区域感应耦合等离子体具有较高的离子密度和较低的电子温度。 - Effect of external magnetic field on ion energy density of collisional radio-frequency sheath
外加磁场对碰撞射频鞘层离子能量分布的影响 - It is shown that the ion velocity entering the sheath would exceed the ion sound velocity due to the existence of dust particles.
由于鞘边尘埃粒子的存在，离子必需以大于声速的速度进入鞘层； - A Monte Carlo Simulation for Bombarding Target with Pulsed Voltage-accelerated Ions in an Ion Sheath Generated in a Glow Discharge
高压加速辉光放电离子阵鞘层离子轰击靶阴极的蒙特卡罗模拟 - The temporal and spatial evolution of a dusty plasma sheath in plasma source ion implantation has been investigated with a fluid theory and a self-consistent dust-charging model. A negative potential pulse is introduced to form the plasma sheath.
采用流体模型及自洽的尘埃粒子充电模型，我们研究了等离子体源离子注入时的尘埃等离子体鞘层的时空演化。 - Numerical results show that the initial emitted electron bean-current density and the neutral gas density are two important physics quantities affecting the sheath parameters, such as the ion density, ion current density, and the sheath electric field.
数值结果表明：发射电子的初始束流密度及中性气体密度是描述鞘层空间演化的两个最关键的物理量，特别是发射电子的存在使得鞘层厚度变薄。 - The models include the equation of ion continuity, momentum equation, Poisson equation and equivalent circuit equation, through which the relationship can be determined between insulated substrate surface potential, charge density and sheath thickness.
模型包括离子连续性方程、动量方程和泊松方程，特别是提出了可以自洽地决定绝缘基板表面电势、表面电荷密度和鞘层厚度关系的等效电路方程。 - Finally, the propagation of ion matrix sheath boundary during the negative pulse duration is calculated.
最后计算了在负偏压脉冲持续时间内离子阵鞘层边界的扩展。 - The energy and angle distribu-tions of N+ ions at the spherical target during the sheath edge evolution after the ion matrix sheath for different pressures are investigated in detail.
模拟了不同气压下，在鞘层扩展过程中，氮离子N2~+到达靶表面的能量分布和入射角分布，研究了它们的变化规律。 - When dielectric sheet ( polymer, semiconductor and so on) supported by a metal electrode are implanted by means of Plasma Immersion Ion Implantation ( PIII), the thickness and the potential profiles of ion-matrix sheath are studied.
该文研究了在等离子体浸没离子注入（PIII）中介质材料（高聚物、半导体等）为被注入对象时，其周围离子体鞘的扩展厚度和电势特征。 - Our results demonstrate that the sheath thickness, including the initial ion matrix sheath and final steady state sheath, increases with the increase of the spherical radius or applied voltage, and decreases with increasing plasma density.
计算结果表明，鞘层厚度（包括离子阵鞘层和稳态鞘层）随球体半径或注入电压增加而增加，随等离子体密度增加而减小。 - Ion species and their energy in the cathode sheath of N 2 abnormal glow discharges with short electrode interval were determined by molecular beam mass spectrometry ( MBMS).
利用国内首台三级差分抽空的分子束质谱装置，对短间隙氮异常辉光放电阴极鞘层区正离子组分及能量分布进行了诊断研究。 - Plasma immersion ion implantation ( PIII) for a planar target was simulated using 2D particle-in-cell ( PIC) model. The plasma sheath evolution has been investigated.
采用二维元胞粒子模型（PIC），模拟了一个完整脉冲时段内，等离子体浸没离子注入平板靶的过程。 - Using the expressions for ion density and total sheath potential difference, the relation between ion energy flux when reaching the material surface and the driving RF current density is derived.
并利用离子浓度和总鞘电势差的表达式推出到达材料表面时离子的能量通量与射频驱动电流密度的关系式。 - The results show that collisions mostly occur in ion sheath and the lost ratio of collision is mainly related with the distance between the collectors, which should be less than 3 cm. The extraction time can not serve as the criterion for the lost ratio of collision.
影响碰撞损失率的主要因素是极板间距，应选择小于3cm的收集板间距；离子引出时间不是判断碰撞损失率的标准。 - Effect of Plasma Density on Ion Momentum in Radio Frequency Plasma Sheath
射频鞘层中等离子体浓度对离子动量的影响 - We present the spatiotemporal variations of the voltage amplitude, the ion density and the electron density inside the sheath.
我们模拟了鞘层中电势、电子密度和离子密度的时空分布等。 - In accordance with an etching model, the measured results of Langmuir probe suggest that the influence mechanism was that different discharge parameters would lead different plasma densities and electron temperatures, so they would result in different ion fluxes and sheath voltages.
根据所建立的刻蚀模型，探针诊断结果表明：直流功率和气压对刻蚀形貌和速率的影响机制在于不同放电条件下等离子体浓度和电子温度不同，从而得到不同的鞘电压和离子通量。 - The spatiotemporal variations of the potential, the electric field, ion density and electron density etc. inside the sheath are studied numerically. The instantaneous sheath thickness, the surface potential at the dielectric substrate and charge density accumulated on dielectric substrates are given.
采用该模型模拟了鞘层内各物理量（包括电势和电场、离子密度和电子密度、离子速度）的时空演化过程，同时给出瞬时的鞘层厚度、介质靶表面电势及表面积累的电荷密度。 - Furthermore, our results indicate that the magnetic field and injected ion beam have significant effects on sheath properties at the wall in the magnetically confined fusion plasmas.
总的来说，我们的计算结果说明在磁约束聚变等离子体中，磁场和入射快离子显著地影响器壁附近的鞘层特性。